We present a new method for nanoscale atom lithography. We propose the use of a supersonic
atomic beam, which provides an extremely high-brightness and cold source of fast atoms. The atoms
are to be focused onto a substrate using a thin magnetic lm, into which apertures with widths on
the order of 100 nm have been etched. Focused spot sizes near or below 10 nm, with focal lengths
on the order of 10 m, are predicted. This scheme is applicable both to precision patterning of
surfaces with metastable atomic beams and to direct deposition of material.